AW-105R Plamsa Asher Plasma Descum for GaAs,GaN,GaInP,InP,SiC (III-V,II-VI Materials)
220 Cochrane Circle
Email: sales@allwin21.com
Morgan Hill, CA 95037
Production Proven AW-105R Plamsa Asher Descum for GaAs,GaN,GaInP,InP,SiC (III-V,II-VI Materials)
sales@allwin21.com
The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology.
AW-105R Applications:
GaAs, InP, GaN, SiC wafer Strip (Mainly)
GaAs, InP, GaN, SiC wafer Descum (Mainly)
Thin Film Head Resist Cleaning
Opto-Electronic Devices Cleaning
MEMS
Photoresist Stripping
High dose implant (As+, B+, P+)
Rework
Post-polysilicon
Post-metal
Post-oxide
Controlled Resist Removal
Post-develop descum
Uniformity capability (<5% 1σ)
AW-105R Key Features:
Production-proven plasma Asher/Descum system.
Integrated solid robotic wafer handling, Single wafer process.
Up to 3%-5% Uniformity. Best for III-V Materials.
Frontside and backside isotropic removal.
Consistent wafer-to-wafer process cycle repeatability.
Element heating for up to 250oC.
50mm-150mm wafer capability. Up to 6.25” substrate.
Up to 4 wafer size capability without hardware change.
Fixed cassette station and wafer aligner/cooling station.
Can handle 50um thickness wafer.
PC controller with Advanced Allwin21 Software.
Endpoint detection (EOP) with Allwin21 SLOPE technology (Optional).
Up to 3 gas lines with MFC.
Air-Cooled 600W MKS 13.56 MHz RF Generator (300W Option).
Pressure control with Throttle Valve.
15-inch Touch screen monitor GUI.
EMO, Interlocks, and Watchdog function.
GEM/SECS II (optional).
Small Footprint
Made in U.S.A.
AW-105R Software Key Features:
Real time graphics display, process data acquisition, and analysis.
Closed-loop process parameters control.
Precise parameters profiles tailored to suit specific process requirements.
Programmable comprehensive calibration of all subsystems from within the software. This allows faster, easier calibration, leading to enhanced process results.
Recipe creation to ensure process repeatability. It features a recipe editor to create and edit recipes to fully automate the processing of wafers inside the process chamber.
Validation of the recipe so improper control sequences will be revealed.
Storage of multiple recipes, process data, and calibration files so that process & calibration results can be maintained or compared over time.
Passwords provide security for the system, recipe editing, diagnostics, calibration, and setup functions.
Simple and easy to use menu screen which allow a process cycle to be easily defined and executed.
Troubleshooting features which allows engineers and service personnel to activate individual subassemblies and functions. More I/O and AD/DA “exposure”.
DB-25F parallel (printer) port. The computer interfaces to the Allwin21 system with only one cable: the control interface cable.
The control board inside the machine that translates the computer commands to control the machine has a watchdog timer. If this board loses communication with the control software, it will shut down all processes and halt the system until communication is restored.
GEM/SECS II function (Optional).
Advanced Allwin21 End of Process (EOP) function (Optional).
AW-105R Specifications:
Wafer Size: Up to 6.25 inch.
Temperature: 60-250ºC (±2ºC)
Gas Lines: Up to three gas lines with MFCs.
Typical MFC configuration: 5 SLM O2 and 500 SCCM N2.
Asher Rate: 0.5-1.5 um/min at 200 to 250 ºC, bulk strip; 600 A/min at 100 ºC, Descum
Uniformity: <±8% (Max-Min) Strip; <±5% (Max-Min) Descum
Particulate: <0.05 /cm2 (0.03um or greater)
Damage: CV:<0.1V from control; Mobile Ion:<1-2 E10 ; Vt :0% total shift on 98% of points tested no shift >5%
Selectivity: >1000:1
MTBF/MTTA/MTTR: 450 Hours/100 Hours/3.5 Hours or Better.
95% uptime
*Contact Allwin21 sales for other applications and specifications
AW-105R Configuration:
Main Frame with Circuit Breakers, Solenoid Valves
Pentium Class PC with AW Software
Keyboard, Mouse, USB SW backup, and Cables
Chuck /w Heat, Pump Ring ,Lift Pins
① 2-4 inch; ② 2-6 inch; ③ 4-6 inch; ④ 6.125 inch; ⑤ 6.25 inch
Center Aligner and Cassette Station
① Two Dimensions ② Four Dimensions
Anodized Reactor with Door
Chamber Base plate with water sensor
Base Plate and Reactor Ceramic Ring
Base Plate and Chuck Ceramic Ring
Upper and Lower Electrodes
Quartz showerhead & Diffusion Disk
Main Control and Distribution PCBs
3-axis Integrated Robust Solid Robot
RF Matching Network with PCBs
13.56MHz RF Generator
① 300W ② 600W
MFC /w In-line Filter and Solenoid Isolation Valve
① One MFC; ② Two MFCs; ③ Three MFCs
AC/DC Box with Temperature Controller
MKS Baratron with Isolation Valve
Lamp Tower Alarm w/ Buzzer
Throttle Valve
Main Vacuum Valve
Front EMO, Interlocks
15-inch Touch Screen GUI
AW-105R Options:
End-of-Process (EOP)
GEM/SECS II (Software)
Vacuum Pump
Chiller for Chamber Base Plate
Keywords:Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10
Keywords: Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10
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Interview Q&A
How long have you been in business?
15 years
What is your primary product or service?
Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition and Metal Film Metrology high-tech semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. We endeavor to be a leader in our product lines.
We focus on extending product lifecycle, providing solutions, and engineering enhancements to many production proven semiconductor process equipment most directly related to III-V processing. These semiconductor equipment have been used in production and R&D since the 1990′s. They have proven processes and research. Allwin21 Corp. customizes these systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components. This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts.
Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool. We are manufacturing the new AccuThermo AW Series Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced real time temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.
We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships.
We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support. We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades
What sets us apart from the competition…
1) Exclusive licensed manufacturer of Heatpulse 610 of AG Associates.
2) Advanced Allwin21 Real Time PC Control Technology.
3) Focus on Production-Proven process technology.
4) Integrated 3-axis solid robotic wafer transfer technology.
5) Experienced local engineer support.
6) Products made in U.S.A
Main Products:
Rapid Thermal Process
AccuThermo AW410
AccuThermo AW610
AccuThermo AW810
AccuThermo AW820
AccuThermo AW610V
AccuThermo AW820V
Sputter Deposition
AccuSputter AW4450
Perkin Elmer 4400
Perkin Elmer 4410
Perkin Elmer 4450
Plasma Ash/Descum
AW-105R
AW-1008
AW-B3000
Plasma Etch/RIE
AW-2001R
AW-901eR
AW-903eR
TTW AW-901eR
TTW AW-903eR
Metal Film Metrology
AWgage-150
AWgage-200
Upgrade Kits for :
AG Associates Heatpulse 210, Minipulse 310, Heatpulse 410, Heatpulse 610 Rapid Thermal Processing equipment; Tegal 901e, Tegal 903e, Gasonics AE 2001, Matrix 303, Matrix 403, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam AutoEtch 480, Lam AutoEtch 580, Lam AutoEtch 680, Lam AutoEtch 780 Plasma Etcher equipment;Matrix 105, Matrix 106,Matrix 205, Matrix 101,Matrix 102,Matrix 103, Matrix 104, Matrix 10, Gasonics Aura 1000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000 Plasma Asher ,Plasma Descum Equipment; Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Perkin-Elmer 2400 sputter deposition systems
How did you first become interested in your line of business? (if owner) - What is your background? (If owner or store manager)
We have been the process engineer and equipment engineer for more than 20 years.
How do you differentiate yourself from other businesses in your category and area?
1) Exclusive licensed manufacturer of Heatpulse 610 of AG Associates.
2) Advanced Allwin21 Real Time PC Control Technology.
3) Focus on Production-Proven process technology.
4) Integrated 3-axis solid robotic wafer transfer technology.
5) Experienced local engineer support.
How many locations do you have and do you have plans to expand?
All over the world.
Provide detailed directions to your location
220 Cochrane Circle, Morgan Hill,CA95037
What type of payments do you accept?
Cash,Check,remit
What are your hours of operation?
9am-5pm
Contact AW-105R Plamsa Asher Plasma Descum for GaAs,GaN,GaInP,InP,SiC (III-V,II-VI Materials):
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